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Enhanced hole transport in InGaN/GaN multiple quantum well light-emitting diodes with a p-type doped quantum barrier

机译:具有p型掺杂量子势垒的InGaN / GaN多量子阱发光二极管中的空穴传输增强

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摘要

We study hole transport behavior of InGaN/GaN light-emitting diodes with the dual wavelength emission method. It is found that at low injection levels, light emission is mainly from quantum wells near p-GaN, indicating that hole transport depth is limited in the active region. Emission from deeper wells only occurs under high current injection. However, with Mg-doped quantum barriers, holes penetrate deeper within the active region even under low injection, increasing the radiative recombination. Moreover, the improved hole transport leads to reduced forward voltage and enhanced light generation. This is also verified by numerical analysis of hole distribution and energy band structure. © 2013 Optical Society of America.
机译:我们采用双波长发射方法研究了InGaN / GaN发光二极管的空穴传输行为。发现在低注入水平下,发光主要来自p-GaN附近的量子阱,这表明空穴传输深度在有源区中受到限制。仅在大电流注入下才会发生来自更深井的发射。但是,使用掺Mg的量子势垒,即使在低注入下,空穴也能在有源区内更深地穿透,从而增加了辐射复合。而且,改善的空穴传输导致降低的正向电压和增强的光产生。空穴分布和能带结构的数值分析也证实了这一点。 ©2013美国眼镜学会。

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